【公開日：2023.08.01】【最終更新日：2023.05.31】
課題データ / Project Data
課題番号 / Project Issue Number
22NU0263
利用課題名 / Title
Unidirectional thermal conductivity enhancement in yttrium Iron garnet due to the effect of spin waves
利用した実施機関 / Support Institute
名古屋大学 / Nagoya Univ.
機関外・機関内の利用 / External or Internal Use
内部利用（ARIM事業参画者以外）/Internal Use (by non ARIM members)
技術領域 / Technology Area
【横断技術領域 / Cross-Technology Area】（主 / Main）加工・デバイスプロセス/Nanofabrication（副 / Sub）-
【重要技術領域 / Important Technology Area】（主 / Main）量子・電子制御により革新的な機能を発現するマテリアル/Materials using quantum and electronic control to perform innovative functions（副 / Sub）-
キーワード / Keywords
リソグラフィ/Lithography,スパッタリング/Sputtering
利用者と利用形態 / User and Support Type
利用者名（課題申請者）/ User Name (Project Applicant)
上野 藍
所属名 / Affiliation
名古屋大学大学院工学研究科
共同利用者氏名 / Names of Collaborators in Other Institutes Than Hub and Spoke Institutes
ARIM実施機関支援担当者 / Names of Collaborators in The Hub and Spoke Institutes
利用形態 / Support Type
（主 / Main）機器利用/Equipment Utilization（副 / Sub）-
利用した主な設備 / Equipment Used in This Project
NU-208：両面露光用マスクアライナ
NU-222：レーザー描画装置
NU-245：スパッタリング装置
報告書データ / Report
概要（目的・用途・実施内容）/ Abstract (Aim, Use Applications and Contents)
The main objective of this research is detecting and measuring the asymmetric thermal conductivity enhancement due to the interaction between electrons, spin waves and phonons. For that, a measurement technique is developed based on lock-in thermography technique to prove and quantitively measuring this enhancement. Accordingly, a metallic line heater configuration at nano-scale needs to be deposited on the surface of the measured material by photolithography and sputtering techniques.
実験 / Experimental
The laser mask writer Heidelberg DWL66FS is used to write a Cr mask of the heater configuration. The mask aligner MA-6 is then used for the photolithography process. After that, the sputtering device E-200S is used to deposit a Cr layer 5 nm as an adhesive layer and 50 nm of Au to construct the configuration of the line heater.
結果と考察 / Results and Discussion
Fig.1 shows an example of the locked-in temperature field in term of amplitude and phase form a line heater deposited on SiN. By analyzing the temperature field. The asymmetric thermal conductivity can be estimated. In this study, we could measure the asymmetric thermal conductivity using Lock-In Thermography and nano-fabrication.
図・表・数式 / Figures, Tables and Equations
Fig.1 An example of the locked-in temperature field. Amplitude(Left) and Phase(Right) .
その他・特記事項（参考文献・謝辞等） / Remarks(References and Acknowledgements)
None
成果発表・成果利用 / Publication and Patents
論文・プロシーディング（DOIのあるもの） / DOI (Publication and Proceedings)
口頭発表、ポスター発表および、その他の論文 / Oral Presentations etc.
特許 / Patents
特許出願件数 / Number of Patent Applications：0件
特許登録件数 / Number of Registered Patents：0件