【公開日：2024.07.25】【最終更新日：2024.06.27】
課題データ / Project Data
課題番号 / Project Issue Number
23WS0031
利用課題名 / Title
シリコン・化合物微細加工光機能デバイス
利用した実施機関 / Support Institute
早稲田大学 / Waseda Univ.
機関外・機関内の利用 / External or Internal Use
内部利用（ARIM事業参画者以外）/Internal Use (by non ARIM members)
技術領域 / Technology Area
【横断技術領域 / Cross-Technology Area】（主 / Main）計測・分析/Advanced Characterization（副 / Sub）加工・デバイスプロセス/Nanofabrication
【重要技術領域 / Important Technology Area】（主 / Main）高度なデバイス機能の発現を可能とするマテリアル/Materials allowing high-level device functions to be performed（副 / Sub）-
キーワード / Keywords
電子顕微鏡/ Electronic microscope,CVD,光学顕微鏡/ Optical microscope,リソグラフィ/ Lithography,電子線リソグラフィ/ EB lithography,ダイシング/ Dicing
利用者と利用形態 / User and Support Type
利用者名（課題申請者）/ User Name (Project Applicant)
HEINSALU SIIM
所属名 / Affiliation
早稲田大学 基幹理工学部 電子物理システム学科
共同利用者氏名 / Names of Collaborators in Other Institutes Than Hub and Spoke Institutes
Takashi Kan; KDDI Research, inc.
ARIM実施機関支援担当者 / Names of Collaborators in The Hub and Spoke Institutes
Masatoshi Suzuki; KDDI Research, inc.,Hideaki Tanaka; KDDI Research, inc.
利用形態 / Support Type
（主 / Main）機器利用/Equipment Utilization（副 / Sub）,技術相談/Technical Consultation
利用した主な設備 / Equipment Used in This Project
WS-015：電子ビーム描画装置
WS-016：レーザー直接描画装置
WS-003：電子ビーム蒸着装置
WS-027：ダイシングソー
WS-007：ICP-RIE装置
報告書データ / Report
概要（目的・用途・実施内容）/ Abstract (Aim, Use Applications and Contents)
In recent years, AI has rapidly advanced with novel algorithms and increased computing power, transforming various domains and becoming indispensable in many fields. Despite conventional AI's challenges with long learning times and high power consumption, reservoir computing (RC) has emerged as a promising alternative. This study focuses on feedforward optical RC utilizing multimode waveguides (MMWs). This structure was later utilized in relation to the following project: シリコンフォトニクス光リザバーコンピューティング
実験 / Experimental
The samples underwent fabrication on silicon-on-insulator (SOI) substrates through a series of processes, namely electron beam lithography (EBL), inductively coupled plasma reactive ion etching (ICP-RIE), plasma chemical vapor deposition (Plasma-CVD), ultraviolet lithography (UVL), electron beam vapor deposition (EBVD), and wafer dicing. For detailed steps contact: siim.heinsalu@fuji.waseda.jp
結果と考察 / Results and Discussion
Simulations demonstrated results such as 0.046 NMSE in Santa Fe prediction and high-performance chaotic time series prediction at 12.5 GS/s on millimeter-scale chips. While the current method generates MMW modes by scanning with a tip-sphere fiber, practical implementation requires considering the placement of an equivalent number of photodiodes (PDs) within the reservoir. Existing reports on Arrayed Waveguide Gratings (AWGs) offer insights into PD placement for single-mode waveguides, but for MMWs in RC, optimal output configurations are unexplored. Further, from experimental analysis mode mixing and all of the ports working as needed was confirmed.
図・表・数式 / Figures, Tables and Equations
その他・特記事項（参考文献・謝辞等） / Remarks(References and Acknowledgements)
The authors express their gratitude to Advanced Research Infrastructure for Materials and Nanotechnology in Japan (ARIM) of MEXT for granting permission to utilize the cleanroom facilities and equipment essential for fabricating the samples within the scope of this study.Hirotaka Oshima led the primary analysis through simulations for this work, while Siim Heinsalu supervised the experimental aspects. Members from KDDI Research, Inc. played a valuable role in discussions and the design of the device under consideration.
成果発表・成果利用 / Publication and Patents
論文・プロシーディング（DOIのあるもの） / DOI (Publication and Proceedings)
-
Hirotaka Oshima, Low Loss Fan-Out Structure for Multimode Waveguide-Based Reservoir Computing, 2023 International Conference on Photonics in Switching and Computing (PSC), , 1-3(2023).
DOI: 10.1109/PSC57974.2023.10297276
口頭発表、ポスター発表および、その他の論文 / Oral Presentations etc.
特許 / Patents
特許出願件数 / Number of Patent Applications：0件
特許登録件数 / Number of Registered Patents：0件