【公開日：2023.08.01】【最終更新日：2023.05.26】
課題データ / Project Data
課題番号 / Project Issue Number
22KU0033
利用課題名 / Title
Damage Analysis and Control in Germanium Micro/Nanopore Fabricated using Focused Ion Beam for Photonic Crystal Structure
利用した実施機関 / Support Institute
九州大学 / Kyushu Univ.
機関外・機関内の利用 / External or Internal Use
外部利用/External Use
技術領域 / Technology Area
【横断技術領域 / Cross-Technology Area】（主 / Main）計測・分析/Advanced Characterization（副 / Sub）-
【重要技術領域 / Important Technology Area】（主 / Main）次世代ナノスケールマテリアル/Next-generation nanoscale materials（副 / Sub）量子・電子制御により革新的な機能を発現するマテリアル/Materials using quantum and electronic control to perform innovative functions
キーワード / Keywords
germanium, ion milling, micro/nanopore, damage, redeposition
利用者と利用形態 / User and Support Type
利用者名（課題申請者）/ User Name (Project Applicant)
Siti Rahmah Binti Aid
所属名 / Affiliation
Malaysia-Japan International Institute of Technology, Universiti Teknologi Malaysia
共同利用者氏名 / Names of Collaborators in Other Institutes Than Hub and Spoke Institutes
ARIM実施機関支援担当者 / Names of Collaborators in The Hub and Spoke Institutes
GAO HONGYE
利用形態 / Support Type
（主 / Main）技術補助/Technical Assistance（副 / Sub）-
利用した主な設備 / Equipment Used in This Project
報告書データ / Report
概要（目的・用途・実施内容）/ Abstract (Aim, Use Applications and Contents)
Germanium (Ge) photonic crystal has gained interest due to their ability to tune the bandgap of sunlight wavelengths which can help in improving the efficiency of the device such as photovoltaic (PV) cell performance. However, fabricating photonic crystal structure on Ge substrate using focused ion beam (FIB) with minimal physical damage requires prompt solution due to the impact of ion sputtering during the ion milling process.
実験 / Experimental
The effect of ion beam parameters (current and accelerating voltage) on the roughness and redeposition to the Ge substrate’s surface during the milling process of an array of micropore structure were evaluated.
結果と考察 / Results and Discussion
From the experimental work, it is found that the milling damages was severe resulting in the damaged structure on Ge substrate surface. Further consideration on ion-milling process is necessary for a better quality of the structure.
図・表・数式 / Figures, Tables and Equations
その他・特記事項（参考文献・謝辞等） / Remarks(References and Acknowledgements)
This work is partly supported by the Ministry of Higher Education Malaysia FRGS Grant, and MJIIT-Takasago Research Grant. Special thanks to the collaborators from Kyushu University.
成果発表・成果利用 / Publication and Patents
論文・プロシーディング（DOIのあるもの） / DOI (Publication and Proceedings)
口頭発表、ポスター発表および、その他の論文 / Oral Presentations etc.
特許 / Patents
特許出願件数 / Number of Patent Applications：0件
特許登録件数 / Number of Registered Patents：0件