利用報告書 / User's Reports


【公開日:2024.07.25】【最終更新日:2024.03.28】

課題データ / Project Data

課題番号 / Project Issue Number

23IT0056

利用課題名 / Title

Fabrication of Micro-patterns

利用した実施機関 / Support Institute

東京工業大学 / Tokyo Tech.

機関外・機関内の利用 / External or Internal Use

外部利用/External Use

技術領域 / Technology Area

【横断技術領域 / Cross-Technology Area】(主 / Main)加工・デバイスプロセス/Nanofabrication(副 / Sub)-

【重要技術領域 / Important Technology Area】(主 / Main)量子・電子制御により革新的な機能を発現するマテリアル/Materials using quantum and electronic control to perform innovative functions(副 / Sub)次世代ナノスケールマテリアル/Next-generation nanoscale materials

キーワード / Keywords

光リソグラフィ/ Photolithgraphy,原子薄膜/ Atomic thin film,原子層薄膜/ Atomic layer thin film


利用者と利用形態 / User and Support Type

利用者名(課題申請者)/ User Name (Project Applicant)

崔 埈豪

所属名 / Affiliation

東京都市大学 理工学部 機械工学科

共同利用者氏名 / Names of Collaborators in Other Institutes Than Hub and Spoke Institutes
ARIM実施機関支援担当者 / Names of Collaborators in The Hub and Spoke Institutes
利用形態 / Support Type

(主 / Main)機器利用/Equipment Utilization(副 / Sub),機器利用/Equipment Utilization


利用した主な設備 / Equipment Used in This Project

IT-003:マスクレス露光装置


報告書データ / Report

概要(目的・用途・実施内容)/ Abstract (Aim, Use Applications and Contents)

Fabrication of micro-patterns on Diamond-like Carbon (DLC) films has various industrial applications that yet have not been fully discovered. The aim of this study is to explore the viability of the photolithographic technology to produce multiple patterns.

実験 / Experimental

To fabricate micro-patterns on DLC top surface substrate, certain experimental procedures are followed including;1- Using the spin coating machine to coat HMDS and S1818 photoresist2- Heating the substrate at 110-125 oC after each coating material using a heater.3- Utilizing the Maskless exposure equipment Dainihon Kaken MX-1205 to produce the designed patterns.4- Remove the unpatterned areas using the AZ300MIF development solution.5- Confirm the patterns with a microscope.

結果と考察 / Results and Discussion

After fabricating various pattern sizes ranging from 3*3 to 10*10 microns, it appears that 3*3, 4*4, and 5*5 patterns are distorted compared to the other sizes.We believe that the surface roughness of the DLC top surface has a huge influence on the resolution of the patterns. Therefore, we are considering depositing a thin metallic layer on the DLC film to counter this issue.

図・表・数式 / Figures, Tables and Equations
その他・特記事項(参考文献・謝辞等) / Remarks(References and Acknowledgements)


成果発表・成果利用 / Publication and Patents

論文・プロシーディング(DOIのあるもの) / DOI (Publication and Proceedings)
口頭発表、ポスター発表および、その他の論文 / Oral Presentations etc.
特許 / Patents

特許出願件数 / Number of Patent Applications:0件
特許登録件数 / Number of Registered Patents:0件

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