【公開日：2024.07.25】【最終更新日：2024.04.11】
課題データ / Project Data
課題番号 / Project Issue Number
23NM5247
利用課題名 / Title
Application of LaB6 nanowire emitter in electron microscopes
利用した実施機関 / Support Institute
物質・材料研究機構 / NIMS
機関外・機関内の利用 / External or Internal Use
内部利用（ARIM事業参画者以外）/Internal Use (by non ARIM members)
技術領域 / Technology Area
【横断技術領域 / Cross-Technology Area】（主 / Main）計測・分析/Advanced Characterization（副 / Sub）-
【重要技術領域 / Important Technology Area】（主 / Main）次世代ナノスケールマテリアル/Next-generation nanoscale materials（副 / Sub）-
キーワード / Keywords
走査型電子顕微鏡/ Scanning electron microscopy, ナノワイヤ、ナノチューブ/ Nanowires and nanotubes,電子顕微鏡/ Electronic microscope,ナノワイヤー・ナノファイバー/ Nanowire/nanofiber
利用者と利用形態 / User and Support Type
利用者名（課題申請者）/ User Name (Project Applicant)
張 晗
所属名 / Affiliation
物質・材料研究機構
共同利用者氏名 / Names of Collaborators in Other Institutes Than Hub and Spoke Institutes
山内 陽介
ARIM実施機関支援担当者 / Names of Collaborators in The Hub and Spoke Institutes
西宮 ゆき
利用形態 / Support Type
（主 / Main）機器利用/Equipment Utilization（副 / Sub）,技術補助/Technical Assistance
利用した主な設備 / Equipment Used in This Project
報告書データ / Report
概要（目的・用途・実施内容）/ Abstract (Aim, Use Applications and Contents)
I use LaB6 nanowires to fabricate electron emitters for electron microscope use. The fabrication process involves using FIB to modify the shape a Ta needle. After the special shape is made on the Ta needle tip, LaB6 nanowires could be attached to such tip to realize an electron emitter.
実験 / Experimental
Using JIB-4000, FIB milling was performed at two locations on the tip of the Ta needle from two different angles.
結果と考察 / Results and Discussion
We succeeded in milling a Ta needle (Fig.1) using FIB and processing it into a shape suitable for attaching LaB6 nanowires (Fig.2 and 3). With JIB-4000, we were able to perform accurate cutting from 5 μm to 20 μm and sufficient surface smoothing (Fig.4 and 5).
図・表・数式 / Figures, Tables and Equations
Fig.1 Ta needle before processing
Fig.2 Optical image of Ta needle after processing (vertical)
Fig.3 Optical image of Ta needle after processing (horizontal)
Fig.4 SEM image of Ta needle after processing (vertical)
Fig.5 SEM image of Ta needle after processing (horizontal)
その他・特記事項（参考文献・謝辞等） / Remarks(References and Acknowledgements)
This work was supported by NIMS Electron Microscopy Analysis Station, Nanostructural Characterization Group.
成果発表・成果利用 / Publication and Patents
論文・プロシーディング（DOIのあるもの） / DOI (Publication and Proceedings)
口頭発表、ポスター発表および、その他の論文 / Oral Presentations etc.
特許 / Patents
特許出願件数 / Number of Patent Applications：0件
特許登録件数 / Number of Registered Patents：0件