【公開日：2024.07.25】【最終更新日：2024.05.07】
課題データ / Project Data
課題番号 / Project Issue Number
23NM5114
利用課題名 / Title
熱電材料の開発
利用した実施機関 / Support Institute
物質・材料研究機構 / NIMS
機関外・機関内の利用 / External or Internal Use
内部利用（ARIM事業参画者以外）/Internal Use (by non ARIM members)
技術領域 / Technology Area
【横断技術領域 / Cross-Technology Area】（主 / Main）加工・デバイスプロセス/Nanofabrication（副 / Sub）-
【重要技術領域 / Important Technology Area】（主 / Main）マテリアルの高度循環のための技術/Advanced materials recycling technologies（副 / Sub）量子・電子制御により革新的な機能を発現するマテリアル/Materials using quantum and electronic control to perform innovative functions
キーワード / Keywords
未利用資源の有効利用技術/ Technologies for effective utilization of unused resources,蒸着・成膜/ Vapor deposition/film formation,スパッタリング/ Sputtering
利用者と利用形態 / User and Support Type
利用者名（課題申請者）/ User Name (Project Applicant)
森 孝雄
所属名 / Affiliation
物質・材料研究機構
共同利用者氏名 / Names of Collaborators in Other Institutes Than Hub and Spoke Institutes
Hu Zhao,Baba Takahiro,Serhiienko Illia,Bano Sahiba
ARIM実施機関支援担当者 / Names of Collaborators in The Hub and Spoke Institutes
利用形態 / Support Type
（主 / Main）機器利用/Equipment Utilization（副 / Sub）,技術補助/Technical Assistance
利用した主な設備 / Equipment Used in This Project
NM-647：FE-SEM+EDX [S-4800]
NM-641：スパッタ装置 [CFS-4EP-LL #2]
NM-648：FE-SEM+EDX [SU8000]
NM-403：TEM試料自動作製FIB-SEM複合装置
報告書データ / Report
概要（目的・用途・実施内容）/ Abstract (Aim, Use Applications and Contents)
(NM-647) Using SEM to observe the surface morphology of thin film. (NM-648_SEM) To analyze the microstructure and composition of thermoelectric thin films samples. (NM-641) Deposit a metallic layer on thermoelectric thin films by sputtering to observe thermo-reflectance signals. (NM-403) FIB-SEM was used to prepare high-quality samples for TEM observation.
実験 / Experimental
(NM-647) In this work, the surface morphology of films was analyzed using scanning electron microscopy (SEM) (Hitachi High-Tech/S-4800). The surface of the film is coated with a layer of Pt before being transferred to the SEM machine. The accelerating voltage was set between 10-15KV. By collecting and analyzing signals generated by the interaction of electron beams with surface atoms, images depicting the distribution of surface morphology and composition can be generated. (NM-641) 100nm Pt layer was deposited on thermoelectric thin films by sputtering. (NM-403) Samples for TEM were extracted and polished via a FIB-SEM machine. (NM-648) Surface morphology of thin films was obtained using FE-SEM (SU8000). Thin films were coated with Pt layer before loading for SEM observation. After this, specimen was loaded for SEM observation during this process HV should be off. After loading the specimen, the accelerating voltage is set to 10-15kV. Furthermore, sample were focused by adjusting the magnification or alignment. By collecting and analyzing signals generated by the interaction of electron beams with surface atoms, images depicting the distribution of surface morphology and composition can be generated.
結果と考察 / Results and Discussion
(NM-647) SEM is a crucial technology for detecting surface morphology and composition of thin film. The figure shows the surface morphology of Ge film and CaGe2 films on sapphire substrate. The 3d island growth is observed in all samples due to the high lattice mismatch and the huge difference in interface energy between Ge and sapphire substrate. Compared to other thin films, Ge thin films exhibit higher density and a distinct single-crystal orientation. In the case of CaGe2 thin films, a significant reduction in island size is observed. The substantial difference in island sizes may be attributed to the introduction of Ca, as at the same temperature, the migration of Ge atoms on the substrate surface should be uniform. In the CaGe2 film, the reaction between calcium and germanium impedes the diffusion of germanium, thus leading to the formation of small-sized islands. (NM-641) After this experiment, thermo-reflectance signals were observed from the Pt thin film and heat effusion from the Pt layer to the thermoelectric thin film was analyzed. (NM-403) Prepared by FIB-SEM samples were successfully investigated via TEM. High-quality preparation allows us to observe clearly grain boundary interphase and point defects in our samples. (NM-648) SEM images of thin films were successfully obtained using SU8000 which show the size and orientation of grains. The EDS spectra was also performed which shows the composition of our thin films.
図・表・数式 / Figures, Tables and Equations
Fig.1
その他・特記事項（参考文献・謝辞等） / Remarks(References and Acknowledgements)
成果発表・成果利用 / Publication and Patents
論文・プロシーディング（DOIのあるもの） / DOI (Publication and Proceedings)
口頭発表、ポスター発表および、その他の論文 / Oral Presentations etc.
特許 / Patents
特許出願件数 / Number of Patent Applications：0件
特許登録件数 / Number of Registered Patents：0件