【公開日：2024.07.25】【最終更新日：2024.03.25】
課題データ / Project Data
課題番号 / Project Issue Number
23UT1131
利用課題名 / Title
Light-matter coupling in hybrid 2D material photonic devices
利用した実施機関 / Support Institute
東京大学 / Tokyo Univ.
機関外・機関内の利用 / External or Internal Use
外部利用/External Use
技術領域 / Technology Area
【横断技術領域 / Cross-Technology Area】（主 / Main）加工・デバイスプロセス/Nanofabrication（副 / Sub）-
【重要技術領域 / Important Technology Area】（主 / Main）量子・電子制御により革新的な機能を発現するマテリアル/Materials using quantum and electronic control to perform innovative functions（副 / Sub）高度なデバイス機能の発現を可能とするマテリアル/Materials allowing high-level device functions to be performed
キーワード / Keywords
photonic crystal,電子線リソグラフィ/ EB lithography,膜加工・エッチング/ Film processing/etching,ダイシング/ Dicing,フォトニクス/ Photonics,光導波路/ Optical waveguide,フォトニクスデバイス/ Nanophotonics device,光デバイス/ Optical Device
利用者と利用形態 / User and Support Type
利用者名（課題申請者）/ User Name (Project Applicant)
加藤 雄一郎
所属名 / Affiliation
理化学研究所
共同利用者氏名 / Names of Collaborators in Other Institutes Than Hub and Spoke Institutes
Chee Fai FONG
ARIM実施機関支援担当者 / Names of Collaborators in The Hub and Spoke Institutes
利用形態 / Support Type
（主 / Main）機器利用/Equipment Utilization（副 / Sub）-
利用した主な設備 / Equipment Used in This Project
UT-503：超高速大面積電子線描画装置
UT-604：高速シリコン深掘りエッチング装置
UT-900：ステルスダイサー
報告書データ / Report
概要（目的・用途・実施内容）/ Abstract (Aim, Use Applications and Contents)
We use the Takeda cleanroom to fabricate planar 2D photonic crystal waveguides and cavities.
The photonic nanostructures are then used for light-matter coupling with 2D materials.
実験 / Experimental
First, we spin-coat electron-beam resist onto a SOI chip. Then, we perform electron beam lithography to define the photonic nanostructure pattern onto the resist, followed by resist development. Next, we carry out inductively coupled plasma etching to transfer the pattern onto the SOI chip. After removing the remaining resist, we do wet etching with hydrofluoric acid to remove the silicon dioxide layer in the SOI chip in order to produce air suspended Si nanophotonic structures.
結果と考察 / Results and Discussion
We successfully fabricated the photonic crystal structures (Fig.1) and confirmed their optical properties by performing photoluminescence and laser transmission measurements. Since the waveguide mode and cavity resonances are in the near infrared regime, this allows us to couple to van der Waals layered materials which are optically active also in the near infrared regime.
図・表・数式 / Figures, Tables and Equations
Fig.1 Photonic crystal cavity with waveguide. Scale bar represents 5 microns.
その他・特記事項（参考文献・謝辞等） / Remarks(References and Acknowledgements)
The main user, C.F. Fong, is supported by the RIKEN SPDR fellowship. This work is supported in part by JSPS KAKENHI (JP22K14623, JP20J00817 and JP22K14624)
成果発表・成果利用 / Publication and Patents
論文・プロシーディング（DOIのあるもの） / DOI (Publication and Proceedings)
口頭発表、ポスター発表および、その他の論文 / Oral Presentations etc.
- C. F. Fong, D. Yamashita, N. Fang, S. Fujii, Y.-R. Chang, T. Taniguchi, K. Watanabe, Y. K. Kato, “Nanocavity induced by atomically thin transition metal dichalcogenide in photonic crystal waveguide,” JSAP-Optica Joint Symposia, the 84th JSAP Autumn Meeting 2023, Kumamoto, Japan (September 19, 2023).
- C. F. Fong, Y. Ota, Y. Arakawa, S. Iwamoto, Y. K. Kato, “Intrinsically Circularly Polarized Modes Near Exceptional Points due to Symmetry Breaking in a H1 Photonic Crystal Cavity,” International Conference on Nano-photonics and Nano-electronics (ICNN2023), Yokohama, Japan (April 21, 2023).
- C. F. Fong, D. Yamashita, N. Fang, S. Fujii, Y.-R. Chang, T. Taniguchi, K. Watanabe, and Y. K. Kato, Self-Aligned Hybrid Nanocavities Using Atomically Thin Materials, arXiv:2308.10566.
特許 / Patents
特許出願件数 / Number of Patent Applications：0件
特許登録件数 / Number of Registered Patents：0件