【公開日：2025.01.27】【最終更新日：2025.01.23】
課題データ / Project Data
課題番号 / Project Issue Number
23UT1078
利用課題名 / Title
Nascent state of surface lattice resonance achieving pronounced improvement in quality factor
利用した実施機関 / Support Institute
東京大学 / Tokyo Univ.
機関外・機関内の利用 / External or Internal Use
内部利用（ARIM事業参画者以外）/Internal Use (by non ARIM members)
技術領域 / Technology Area
【横断技術領域 / Cross-Technology Area】（主 / Main）加工・デバイスプロセス/Nanofabrication（副 / Sub）-
【重要技術領域 / Important Technology Area】（主 / Main）量子・電子制御により革新的な機能を発現するマテリアル/Materials using quantum and electronic control to perform innovative functions（副 / Sub）-
キーワード / Keywords
表面・界面・粒界制御/ Surface/interface/grain boundary control,蒸着・成膜/ Vapor deposition/film formation,リソグラフィ/ Lithography,電子線リソグラフィ/ EB lithography,膜加工・エッチング/ Film processing/etching,量子効果/ Quantum effect
利用者と利用形態 / User and Support Type
利用者名（課題申請者）/ User Name (Project Applicant)
ドロネー ジャンジャック
所属名 / Affiliation
東京大学大学院工学系研究科機械工学専攻
共同利用者氏名 / Names of Collaborators in Other Institutes Than Hub and Spoke Institutes
BO-WEI LIN,YING-TSUNG LEE,DI XING,ZHIYU WANG,JEAN-JACQUES DELAUNAY
ARIM実施機関支援担当者 / Names of Collaborators in The Hub and Spoke Institutes
利用形態 / Support Type
（主 / Main）機器利用/Equipment Utilization（副 / Sub）-
利用した主な設備 / Equipment Used in This Project
UT-503：超高速大面積電子線描画装置
UT-600：汎用ICPエッチング装置
UT-700：4インチ高真空EB蒸着装置
報告書データ / Report
概要（目的・用途・実施内容）/ Abstract (Aim, Use Applications and Contents)
Surface Lattice Resonances (SLRs) arise from the long-range dipolar interaction in periodic plasmonic metallic nanostructures and exhibit higher quality factors (Q-factors) compared to plasmon resonances supported in isolated metallic nanostructures. In this letter, we report a significant improvement in the Q-factor of SLR by a factor of three via modulating the efficiency of long-range dipolar interaction, which can be achieved by varying the thickness or refractive index of the coating layer on the top of the metallic nanostructures. Under the condition of weak long-range dipolar interaction, we observe a nascent state of SLR located directly at the Rayleigh cut-off wavelength. Due to the absence of in-plane diffraction mode at shorter wavelengths, the nascent-SLR dip exhibits an asymmetric shape with a high Q-factor. The reason to postpone the release of user report:1.To publish the paper
実験 / Experimental
We fabricated the Al nanograting on a fused silica substrate using the standard metal lift-off process(Fig.1). First, the pattern of the Al nanograting was defined in a photoresist (ZEP520A, diluted with anisole (1:1)) using an electron-beam lithography (F7000S-VD02, Advantest, Japan). An Al layer was then deposited on the patterned sample using a thermal evaporator (NSP2, Univ. Tokyo, Japan), followed by a lift-off procedure. Finally, the SiO2 layer was deposited on the Al nanograting by sputtering (S-QAM, ULVAC, Japan).
結果と考察 / Results and Discussion
We provided a detailed analysis of the properties of SLRs for a finite-size homogenous RI environment and experimentally realized such a plasmonic SLR with a Q-factor of 125 in the UV region(Fig.2). This high Q-factor resonance in the UV region outperformed other reported resonance modes in metallic nanostructures, thus expanding the possibility for applying SLRs in the emerging field of UV plasmonic including nanolasers, sensing devices, and photocatalytic systems.
図・表・数式 / Figures, Tables and Equations
FIg.1 The fabricated Al nanograting on the fused silica substrate.
FIg.2 Measured zero-order transmittance spectra of the Al nanograting coated with 60, 100, 140, 180, and 220 nm thick SiO2 layer.
その他・特記事項（参考文献・謝辞等） / Remarks(References and Acknowledgements)
成果発表・成果利用 / Publication and Patents
論文・プロシーディング（DOIのあるもの） / DOI (Publication and Proceedings)
口頭発表、ポスター発表および、その他の論文 / Oral Presentations etc.
特許 / Patents
特許出願件数 / Number of Patent Applications：0件
特許登録件数 / Number of Registered Patents：0件