【公開日：2023.08.01】【最終更新日：2023.05.22】

課題データ / Project Data

課題番号 / Project Issue Number

22KT1441

利用課題名 / Title

単結晶シリコンマイクロミラーの信頼性に及ぼす梁加工プロセスの影響評価

利用した実施機関 / Support Institute

京都大学 / Kyoto Univ.

機関外・機関内の利用 / External or Internal Use

内部利用（ARIM事業参画者以外）/Internal Use (by non ARIM members)

技術領域 / Technology Area

【横断技術領域 / Cross-Technology Area】（主 / Main）加工・デバイスプロセス/Nanofabrication（副 / Sub）-

【重要技術領域 / Important Technology Area】（主 / Main）マルチマテリアル化技術・次世代高分子マテリアル/Multi-material technologies / Next-generation high-molecular materials（副 / Sub）-

キーワード / Keywords

マイクロミラー,信頼性,膜加工・エッチング/Film processing and Etching,CVD

利用者と利用形態 / User and Support Type

利用者名（課題申請者）/ User Name (Project Applicant)

廣谷 潤

所属名 / Affiliation

京都大学　大学院工学研究科

共同利用者氏名 / Names of Collaborators in Other Institutes Than Hub and Spoke Institutes

夏園林

ARIM実施機関支援担当者 / Names of Collaborators in The Hub and Spoke Institutes

利用形態 / Support Type

（主 / Main）機器利用/Equipment Utilization（副 / Sub）-

利用した主な設備 / Equipment Used in This Project

KT-216：紫外線ナノインプリントボンドアライメント装置
KT-205：プラズマCVD装置
KT-235：深堀りドライエッチング装置（２）

報告書データ / Report

概要（目的・用途・実施内容）/ Abstract (Aim, Use Applications and Contents)

The purpose of this research is to realize high fracture strength and long fatigue life micromirrors with low cost. We compared the reliabilities of micromirrors made from Si and SOI wafers by fracture and fatigue tests under torsional load. Four types of micromirror with different dimensions were fabricated using both wafers. Torsional fracture and fatigue tests were conducted using a custom-made vibration test system. The effect of the fabrication process was evaluated.

実験 / Experimental

Mirror specimens were fabricated using Si and SOI wafers as shown in Fig. 1. Upper and lower side photolithography were carried out by UV-nanoimprint lithography and infrared mask aligner while the deep reactive ion etching machine was used for silicon trench etching from the both sides. An oxide protective film was formed on the top surface by plasma-enhanced chemical vapor deposition before backside etching.

結果と考察 / Results and Discussion

The fracture strength of the SOI-made micromirrors was 2.01 to 2.95 GPa, whereas those of the Si-made ones were lower by 10 to 30%. The decrease in strength was caused by the sidewall roughness produced during deep reactive ion etching, since the maximum stress appears at the center line of the torsional beam where high roughness existed. The low fracture strength also shortened the fatigue life of the Si-made mirrors, but there is no significant difference in fatigue exponents (N) between the Si- and SOI-made samples.

図・表・数式 / Figures, Tables and Equations

Fig. 1 Sample fabrication

その他・特記事項（参考文献・謝辞等） / Remarks(References and Acknowledgements)

成果発表・成果利用 / Publication and Patents

論文・プロシーディング（DOIのあるもの） / DOI (Publication and Proceedings)

口頭発表、ポスター発表および、その他の論文 / Oral Presentations etc.

特許 / Patents

特許出願件数 / Number of Patent Applications：0件
特許登録件数 / Number of Registered Patents：0件