【公開日：2023.07.31】【最終更新日：2023.05.25】
課題データ / Project Data
課題番号 / Project Issue Number
22UT1138
利用課題名 / Title
Photonic crystal for 2D material light-matter coupling
利用した実施機関 / Support Institute
東京大学
機関外・機関内の利用 / External or Internal Use
外部利用/External Use
技術領域 / Technology Area
【横断技術領域 / Cross-Technology Area】（主 / Main）加工・デバイスプロセス/Nanofabrication（副 / Sub）-
【重要技術領域 / Important Technology Area】（主 / Main）高度なデバイス機能の発現を可能とするマテリアル/Materials allowing high-level device functions to be performed（副 / Sub）-
キーワード / Keywords
リソグラフィ/Lithography,EB,光導波路/ Optical waveguide,MEMSデバイス/ MEMS device
利用者と利用形態 / User and Support Type
利用者名（課題申請者）/ User Name (Project Applicant)
加藤 雄一郎
所属名 / Affiliation
理化学研究所
共同利用者氏名 / Names of Collaborators in Other Institutes Than Hub and Spoke Institutes
C.F. Fong
ARIM実施機関支援担当者 / Names of Collaborators in The Hub and Spoke Institutes
利用形態 / Support Type
（主 / Main）機器利用/Equipment Utilization（副 / Sub）-
利用した主な設備 / Equipment Used in This Project
UT-503：超高速大面積電子線描画装置
UT-604：高速シリコン深掘りエッチング装置
UT-900：ステルスダイサー
報告書データ / Report
概要（目的・用途・実施内容）/ Abstract (Aim, Use Applications and Contents)
We use the Takeda cleanroom to fabricate planar 2D photonic crystal waveguides. The waveguides are then used for light-matter coupling with 2D materials.
実験 / Experimental
First, we spin-coat electron-beam resist onto a SOI chip. Then, we perform electron beam lithography to define the photonic crystal waveguide pattern onto the resist, followed by resist development. Next, we carry out inductively coupled plasma etching to transfer the pattern onto the SOI chip. After removing the remaining resist, we do wet etching with hydrofluoric acid to remove the silicon dioxide layer in the SOI chip in order to produce air-suspended Si structures.
結果と考察 / Results and Discussion
We successfully fabricated the photonic crystal waveguide based on the results of the photoluminescence and optical transmission measurements. The fabricated photonic crystal waveguides are largely consistent with the simulated design in terms of the transmission wavelength range with a transmission cut-off in the infrared regime ranging from ~1260nm - 1340nm. A relatively large array of photonic crystal waveguides are fabricated at a time such that the chip can be reused for many different rounds of further sample preparation with 2D materials. Based on our current experimental plan, we will fabricate more waveguides with different transmission cut-off in order to gain further insights of the light-matter interaction with 2D materials.
図・表・数式 / Figures, Tables and Equations
Figure 1. Optical micrograph of photonic crystal waveguide chip after repeated transfer of 2D materials onto it. The field of view is approximately 2mm x 2mm
その他・特記事項（参考文献・謝辞等） / Remarks(References and Acknowledgements)
The main user, C.F. Fong, is supported by the RIKEN SPDR fellowship.This work is supported in part by JSPS KAKENHI (JP22K14623, JP20J00817 and JP22K14624)
成果発表・成果利用 / Publication and Patents
論文・プロシーディング（DOIのあるもの） / DOI (Publication and Proceedings)
口頭発表、ポスター発表および、その他の論文 / Oral Presentations etc.
- C. F. Fong, D. Yamashita, N. Fang, T. Taniguchi, K. Watanabe and Y. K. Kato, “Formation of heterocavity by deposition of hexagonal boron nitride flake on photonic crystal waveguide,” 83rd JSAP Autumn Meeting, oral 21a-C304-2, September 20-24, 2022, Tohoku University, Sendai, Japan.
特許 / Patents
特許出願件数 / Number of Patent Applications：0件
特許登録件数 / Number of Registered Patents：0件