【公開日：2023.07.31】【最終更新日：2023.05.15】
課題データ / Project Data
課題番号 / Project Issue Number
22UT0426
利用課題名 / Title
Investigation of planarity and roughness for a thin film on pattern
利用した実施機関 / Support Institute
東京大学
機関外・機関内の利用 / External or Internal Use
外部利用/External Use
技術領域 / Technology Area
【横断技術領域 / Cross-Technology Area】（主 / Main）計測・分析/Advanced Characterization（副 / Sub）-
【重要技術領域 / Important Technology Area】（主 / Main）次世代ナノスケールマテリアル/Next-generation nanoscale materials（副 / Sub）-
キーワード / Keywords
Thin films, PECVD, planarity, roughness, Scanning probe microscope ,走査プローブ顕微鏡/Scanning probe microscopy,走査プローブ顕微鏡/Scanning probe microscopy
利用者と利用形態 / User and Support Type
利用者名（課題申請者）/ User Name (Project Applicant)
Ghodke Swapnil
所属名 / Affiliation
ASM Japan KK
共同利用者氏名 / Names of Collaborators in Other Institutes Than Hub and Spoke Institutes
Amalraj, Frank Wilson,Tamal Saha
ARIM実施機関支援担当者 / Names of Collaborators in The Hub and Spoke Institutes
OTA Etsuko
利用形態 / Support Type
（主 / Main）機器利用/Equipment Utilization（副 / Sub）,技術補助/Technical Assistance
利用した主な設備 / Equipment Used in This Project
UT-307：走査型プローブ顕微鏡
報告書データ / Report
概要（目的・用途・実施内容）/ Abstract (Aim, Use Applications and Contents)
Scanning probe microscope measurements were performed at Takeda laboratory, University of Tokyo on thin films deposited by the PECVD method. The objective was to investigate the planarity and roughness of the deposited films using wide-area scans.
実験 / Experimental
Thin films were deposited using the PECVD method where planarity and roughness were characterized using a scanning probe microscope L-traceⅡ(UT-307).
結果と考察 / Results and Discussion
Obtained wide-area scans of 50 µm x 50 µm with a scanning probe microscope. The measurements showed that the roughness of the deposited film was 12.5 nm. 3D topography images and corresponding cross-section profiles were also obtained for the patterned regions on the sample. However, due to instrumental factor bowing was observed for the scanned data, which made the user to perform additional normalization/ flatness corrections to obtain the absolute values. The corrected planarity data was qualitative but needs further investigation to understand the absolute planarity of the film on the substrate.
図・表・数式 / Figures, Tables and Equations
その他・特記事項（参考文献・謝辞等） / Remarks(References and Acknowledgements)
We thank Takeda clean room for providing technical assistance to utilize advanced characterization equipment.
成果発表・成果利用 / Publication and Patents
論文・プロシーディング（DOIのあるもの） / DOI (Publication and Proceedings)
口頭発表、ポスター発表および、その他の論文 / Oral Presentations etc.
特許 / Patents
特許出願件数 / Number of Patent Applications：0件
特許登録件数 / Number of Registered Patents：0件