【公開日：2023.07.31】【最終更新日：2023.05.16】
課題データ / Project Data
課題番号 / Project Issue Number
22UT0161
利用課題名 / Title
キラルフィルタリングおよび円偏光発光に用いる誘電体微細構造を有する外因性キラルメタサーフェス
利用した実施機関 / Support Institute
東京大学 / Tokyo Univ.
機関外・機関内の利用 / External or Internal Use
内部利用（ARIM事業参画者以外）/Internal Use (by non ARIM members)
技術領域 / Technology Area
【横断技術領域 / Cross-Technology Area】（主 / Main）計測・分析/Advanced Characterization（副 / Sub）-
【重要技術領域 / Important Technology Area】（主 / Main）高度なデバイス機能の発現を可能とするマテリアル/Materials allowing high-level device functions to be performed（副 / Sub）-
キーワード / Keywords
分光エリプソメトリ,赤外・可視・紫外分光/Infrared and UV and visible light spectroscopy,エリプソメトリ/Ellipsometry,メタマテリアルメタマテリアル/ Metamaterial
利用者と利用形態 / User and Support Type
利用者名（課題申請者）/ User Name (Project Applicant)
李 瑩聰
所属名 / Affiliation
東京大学
共同利用者氏名 / Names of Collaborators in Other Institutes Than Hub and Spoke Institutes
ARIM実施機関支援担当者 / Names of Collaborators in The Hub and Spoke Institutes
利用形態 / Support Type
（主 / Main）機器利用/Equipment Utilization（副 / Sub）-
利用した主な設備 / Equipment Used in This Project
報告書データ / Report
概要（目的・用途・実施内容）/ Abstract (Aim, Use Applications and Contents)
This experiment aims to measure the optical properties of the materials deposited by the sputtering method. The optical properties of the material obtained by ellipsometry will then be used to build a simulation model. Because the thin film's optical properties may be different based on the different deposition conditions. This measurement can help us precisely control the properties of the thin film and make sure the thickness of the optical thin film is correct. After the deposition parameters are optimized, I will start to fabricate a sample.
実験 / Experimental
Firstly, I deposited the optical thin film on top of the silicon substrate with different deposition parameters. Then, I use ellipsometry to measure the thin-film thickness, refractive index, and extinction coefficient of materials. In this way, I can optimize the thin film properties by finding the best parameters for the thin film deposition.
結果と考察 / Results and Discussion
The optical thin film is deposited on the silicon substrate by using sputtering, and the optical properties of the thin film are characterized by using ellipsometry. The refractive index, extinction coefficient, and thin-film thickness are measured and then used for the numerical simulation. I measured the thickness and optical properties of the SiO2, silver, and Si thin films. Then, the relationship between thin film thickness and deposition conditions can be built. In this way, the best parameters for the thin film deposition can be obtained. Then, the optical properties and thin film thickness measured by ellipsometry will be used to construct the model for the purpose of simulation, so the simulation result can be close to the fabrication result.
図・表・数式 / Figures, Tables and Equations
その他・特記事項（参考文献・謝辞等） / Remarks(References and Acknowledgements)
成果発表・成果利用 / Publication and Patents
論文・プロシーディング（DOIのあるもの） / DOI (Publication and Proceedings)
口頭発表、ポスター発表および、その他の論文 / Oral Presentations etc.
特許 / Patents
特許出願件数 / Number of Patent Applications：0件
特許登録件数 / Number of Registered Patents：0件