【公開日：2024.08.20】【最終更新日：2024.06.06】
課題データ / Project Data
課題番号 / Project Issue Number
22KT1094
利用課題名 / Title
Fabrication and electro-mechanical study of nano-scale resonators
利用した実施機関 / Support Institute
京都大学 / Kyoto Univ.
機関外・機関内の利用 / External or Internal Use
外部利用/External Use
技術領域 / Technology Area
【横断技術領域 / Cross-Technology Area】（主 / Main）加工・デバイスプロセス/Nanofabrication（副 / Sub）-
【重要技術領域 / Important Technology Area】（主 / Main）マルチマテリアル化技術・次世代高分子マテリアル/Multi-material technologies / Next-generation high-molecular materials（副 / Sub）高度なデバイス機能の発現を可能とするマテリアル/Materials allowing high-level device functions to be performed
キーワード / Keywords
NEMS resonator, Gas sensing, Lithography,リソグラフィ/Lithography,膜加工・エッチング/Film processing and Etching,EB,MEMSデバイス/ MEMS device,3D積層技術/ 3D lamination technology
利用者と利用形態 / User and Support Type
利用者名（課題申請者）/ User Name (Project Applicant)
Banerjee Amit
所属名 / Affiliation
京都大学 大学院工学研究科
共同利用者氏名 / Names of Collaborators in Other Institutes Than Hub and Spoke Institutes
Yu Wei
ARIM実施機関支援担当者 / Names of Collaborators in The Hub and Spoke Institutes
江崎裕子
利用形態 / Support Type
（主 / Main）機器利用/Equipment Utilization（副 / Sub）-
利用した主な設備 / Equipment Used in This Project
KT-101：高速高精度電子ビーム描画装置
KT-103：レーザー直接描画装置
KT-154：両面マスクアライナー露光装置
KT-235：深堀りドライエッチング装置（２）
KT-212：シリコン酸化膜犠牲層ドライエッチングシステム
報告書データ / Report
概要（目的・用途・実施内容）/ Abstract (Aim, Use Applications and Contents)
Primary goal of this research is to develop robust fabrication methods for nano-scale resonators. In particular, we are interested in fabricating Si (Micro/Nano electromechanical system) MEMS/ NEMS resonators using the state-of-the art lithography tools in the nanotechnology platform. We investigate the dynamic behavior of the fabricated MEMS/NEMS resonators by either electrical or optical detection methods. We intend to conduct ultrasensitive gas-sensing experiments using the fabricated devices.
実験 / Experimental
We use Silicon-on-Insulator (SOI) wafer with a conductive device layer (2.5 – 7.5 µm thick) to fabricate the devices by cleanroom micro/ nano-fabrication tools (Fig. 1). Metal electrodes are patterned by UV lithography (KT-103:Laser Pattern Generator) and liftoff process, while the nano-beams are patterned by electron-beam lithography tool (KT-101:Ultra-High Precision Electron Beam Lithography). Device layer is etched by deep-reactive ion etching (KT-235:Reactive Ion Deep Silicon Etcher) and then the resonator beam is suspended by vapor HF etching (KT-212:Vapor HF Release Etcher) .
結果と考察 / Results and Discussion
Resonance vibration of MEMS/NEMS resonators are successfully detected. Vibration in the beam is actuated by periodic electrostatic actuation force. Vibration sensing is usually done electrically (inset, Fig. 1); however, for microbeams/ vibration in the anchor area can be sensed by optical method (stroboscopic / Doppler vibrometry) by the Micro System Analyzer by Polytec MSA-500.
図・表・数式 / Figures, Tables and Equations
Fig.1. nano-resonator (inset, frequency response)
その他・特記事項（参考文献・謝辞等） / Remarks(References and Acknowledgements)
成果発表・成果利用 / Publication and Patents
論文・プロシーディング（DOIのあるもの） / DOI (Publication and Proceedings)
口頭発表、ポスター発表および、その他の論文 / Oral Presentations etc.
- Y. Wei, A. Banerjee, Y. Hirai, J. Hirotani, T. Tsuchiya, “Ultrathin Si NEMS Resonators for Gas Sensing with Ultrahigh Sensitivity”, 17th International Conference on Nano/Micro Engineered and Molecular Systems (IEEE NEMS) Online, Apr 2022, pp.72-73.
特許 / Patents
特許出願件数 / Number of Patent Applications：0件
特許登録件数 / Number of Registered Patents：0件