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件名【FCMN 2017】International Conference on Frontiers of Characterization and Metrology for Nanoelectronics
開始日時2017/03/21 17:00
終了日時2017/03/24 17:00
場所Monterey Marriott, Monterey, CA, USA
連絡先della(at)avs.org
詳細 The FCMN will bring together scientists and engineers interested in all aspects of the characterization technology needed for nanoelectronic materials and device research, development, and manufacturing.

Papers are solicited to address materials and device characterization and metrology for:
450 mm; 3D IC Analysis / Metrology; III-V on Si for Advanced CMOS; Alternative Gate Dielectrics; Breakthroughs in Electron Microscopy; Breakthroughs in Lithography; Channel Engineering; CMOS, Extreme CMOS, Beyond CMOS; Critical Analytical Techniques; Defects; Device Manufacturing; Diagnostics; Embedded or Buried Interfaces; Flexible Microelectronics; Graphene and 2D Materials and Devices; Heterogeneous Integration; Hybrid Structures; In-Situ, Real-Time Control and Monitoring; Integrated Metrology; Interconnects; Internet of Things; Lab-on-a-Chip; Magnetics; MEMS/NEMS Metrology Applications; Modeling/Simulation; More than Moore; Nanoelectronics Materials and Devices; Nanoscale Electrical and Optical Measure- ments; Non-Destructive Atomic Scale Methods; Novel Measurement Methods, Breakthroughs; Organic Electronics; Reliability; RAM; Si Photonics;
Spectroscopic Properties for Novel Materials for Nanoelectronics; Spintronics;
Synchrotron and Neutron Techniques; Thin-Films; Ultra-Shallow Junctions; Wafer Manufacturing and New Substrate Materials

Please go to the following URL and see the attachment file for more information.
URL :
http://www2.avs.org/conferences/FCMN/
https://www.nano.gov/node/46
 Call for Papers