Support for nano-fabrication utilizing extremely high-vacuum technology
Yamaguchi University supports your research and development of nano-devises and nano-fabrication processes for both academic and industrial users. Our specific feature is providing technical support for not only nano-fabrication but also extremely high-vacuum technology applications.
About this institute
Features of our support
- Device design and nano-fabrication process for dielectric materials, magnetic materials and superconductivity materials are available.
- Process design for nano-fabrication is supported by equipment such as electron beam lithography system, mask aligner, etching system, and sputtering system, which are located in the clean room.
- High performance equipment is provided such as ultra-high-vacuum five-targets two-chambers sputtering system, which enables you to deposit high-quality multi-layered thin films.
- Highly sensitive outgassing rate measuring systems are provided to develop materials, high vacuum components and electronic devices.
Our experts will support your innovation in the nanotechnology field.
|SEM image of micro-structured |
surface and droplet on the surface
|Titanium vacuum components with|
high vacuum performance
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|Reconstructed image of a hologram pattern generated from a image of letters "NUT"||Metamaterial with a mushroom structure.|
(L:Regist pattern, R:Schematic illustration)
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Support Laboratory of Nano-Fabrication,
Organization for Research Initiatives, Yamaguchi University
2-16-1 Tokiwadai, Ube-shi, Yamaguchi, 755-8611, Japan
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