Nanotechnology Open Facilities in Osaka University
NOF supports the development and evaluation of the resist materials for EUV lithography and the processing and evaluation of nanoscale devices and structures made of organic, inorganic and oxide materials.
About this institute
Nanotechnology Open Facilities (NOF) at Osaka University is managed in close collaboration with Microstructural Analysis Platform, Nanofabrication Platform and Molecule & Material Synthesis Platform. NOF has a contribution to the development of nanofabrication technology using various quantum beams and the nanofabrication is the basic technology on the industrial research innovation. Additionally, NOF makes a contribution to the development and evaluation of the resist materials for EUV lithography and to the processing and evaluation of nanoscale devices and structures made of organic, inorganic and oxide materials.
NOF collaborates with Osaka University Office for University-Industry Collaboration, the Chamber of Commerce and Industry and Nanofabrication Platform Consortium consisting of 16 organizations in Japan and therefore strengthens organic cooperation with local companies and off-campus research organization and strives to establish the basic technology and to create the foundation for new industry.
NOF tries to integrate our users with wisdom of our university and NOF as gateway of all-Japan framework for open use through our three Platforms does not only provide the equipment and facility, but also assist the research overall as the open facility for human resource development in nanotechnology and creation of knowledge and technology for innovation core.
|Focused ion beam system||Super high-definition electron beam lithography system|
| || |
|Deep etching system||Electron beam deposition system|
We did not find any results.
Nanotechnology Open Facilities,
The Institute of Scientific and Industrial Research (ISIR), Osaka University
Mihogaoka 8-1, Ibaraki, Osaka 567-0047, Japan +81-(0)6-6879-4654
(*Please replace "(at)" with @.)