A mission of the NIMS Nanofabrication Platform is to create the innovation by providing advanced nanotechnology and micro-fabrication facilities and technical assistance for academia, industry, and government researchers.
The NIMS Nanofabrication Platform was launched in FY2007 and had a 450-m2 clean room facility consisted of seven rooms for each process; the process characterization, the film-deposition, the dry-etching, the thermal annealing, the exposure & development, the photolithography, and the electron-beam lithography areas. This facility has the advanced nano-scale observation, measurement, and characterization systems and gives supports of three-dimensional fabrication with nanometer-to-millimeter scale for a variety of materials, such as semiconductor, oxide, dielectric, magnetic, and metallurgy, and composite materials with the aid of professional staff.
Furthermore, we extensively promotes an interdisciplinary fusion research between natural and life sciences and collaboration among academia, industry, and government institute. Mutual exchanges among academia, industry, and government researchers in different fields will lead new perspective and unexpected discovery and innovation.