JAEA Advanced Characterization Nanotechnology Platform
(Japan Atomic Energy Agency, JAEA Advanced Nanotechnology Platform(JAEA))

The Japan Atomic Energy Agency (JAEA) supports nanotechnology research and promotes the Nanotechnology Platform project by synchrotron radiation beamlines in SPring-8.

Contact to this institute

【Contact details】
 +81-(0)791-58-2640
  nanopla-office(at)ml.jaea.go.jp
  (*Please replace "(at)" with @.)

About this institute

Synchrotron radiation is electromagnetic radiation emitted from a fast moving electron in an accelerator. It has a number of unique properties: high brilliance, high brightness, wide energy spectrum, polarization, high collimation and pulse light. Such properties enable us to perform investigations which are difficult to do with conventional light sources. Therefore, synchrotron radiation is absolutely necessary tool in many fields: in fundamental science, practical science, industrial application and others.

The Japan Atomic Energy Agency (JAEA) has four contract beamlines (BL11XU, BL14B1, BL22XU, BL23SU) in SPring-8, the world's largest third-generation synchrotron radiation facility, located in Harima Science Garden City in Hyogo. These beamlines have been provided to outside users by the JAEA shared-use system. As one of 10 research centers of the Advanced Characterization Nanotechnology Platform, the JAEA will further improve the support system for outside users.
Resonant inelastic X-ray scattering spectroscopy station
A resonant inelastic X-ray scattering spectrometer equipped with several spherically bent crystal monochromators. Typical energy resolution is 200 meV at the Cu-K edge. This station enables analyses of energy and momentum of electrons in matter. Polarization control/analysis of incident/scattered X-rays enable identification of excited orbits.
Typical application: Study of the relationship between the electronic density of states of the valence band and the activity of platinum catalyst.
Surface X-ray diffractometer
An X-ray diffractometer connected with a molecular beam epitaxy (MBE) chamber. The diffractometer is designed for various surface-structure analytical techniques, e.g., grazing incidence X-ray diffraction, X-ray reflectivity measurement, X-ray crystal truncation rod scattering, and so on. The MBE chamber is equipped with five Knudsen cells for effusion of Ga, In, Sb, and As. Shared use of a new MBE chamber for formation of nitride semiconductor film will commence in FY2015.
Typical application: Real-time observation of the growth process of semiconductor quantum dots.
  
Kappa-type X-ray diffractometer
A kappa-type multi-axis diffractometer designed for various applications in materials research. In particular, an electrochemical cell is prepared, and it is possible to perform in situ observation of the electrode surface and electrode/electrolyte interface under various electrochemical conditions.
Typical application: In situ observation of the surface structural change of a secondary battery electrode during the charging/discharging period.
Surface-chemistry experimental station
A surface-chemistry experimental station designed to study chemical reaction dynamics. This system is equipped with surface observation instruments (LEED, XPS, STM, AFM), surface cleaning systems (Ar-ion sputtering gun and sample annealing system), and a quadruple mass analyzer for product identification. Real-time and in situ photoemission spectroscopy can be performed using an Omicron EA125 electron energy analyzer within a temperature range of 150-1450 K. In addition, a supersonic molecular-beam generator can be used to examine the effect of the kinetic energy of adsorbed molecules on formation of ultrathin films.
Typical applications: In situ photoelectron spectroscopic analysis of the formation process of graphene, nitride films, oxide films, and so on.

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Facilities

Contact

Japan Atomic Energy Agency, JAEA Advanced Nanotechnology Platform
1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5148, Japan
 +81-(0)791-58-2640
  nanopla-office(at)ml.jaea.go.jp
  (*Please replace "(at)" with @.)